发明名称 EXPOSURE OF RESIST
摘要 <p>PURPOSE:To prevent damage of a resist layer due to adherence of the layer to a mask by coating at least the surface of the mask in contact with the layer with organic solution containing specific amounts of silicone and 1,1,1- trichloroethane to form a silicone film, then bringing the mask into contact with the layer, and exposing it. CONSTITUTION:At least the surface of a mask in contact with a resist layer is coated with organic solvent containing 15-25wt.% of silicone and the residue of 1,1,1-tricholorethane to form a silicone film. Then, the mask is brought into contact with the layer, and exposed. Thus, since the silicone film to be scarcely adhered to the resist layer is formed on the mask to be brought into contact with the resist layer, the resist layer is not peeled even if many times of contact exposure is conducted by using one mask.</p>
申请公布号 JPH03190216(A) 申请公布日期 1991.08.20
申请号 JP19890328520 申请日期 1989.12.20
申请人 SUMITOMO METAL MINING CO LTD 发明人 NAGANAMI TAKESHI
分类号 G03F1/76;G03F7/20;H01L21/027 主分类号 G03F1/76
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