发明名称 Photosensitive resin composition.
摘要 <p>Disclosed is a photosensitive resin composition which has improved water developability and storage stability. The composition comprises (I) crosslinked resin particles prepared by a post-emulsion method from (a) a base resin having a glass transition temperature (Tg) of 0 DEG C or less and a polymerizable double bond, (b) a monomer which, when polymerized, provides a resin in which Tg is 20 DEG C higher than that of the base resin, or a resin in which Tg is 20 DEG C higher than that of the base resin, (c) a polyvinyl compound, and (d) a polymerization initiator (II) a photopolymerizable unsaturated monomer, and (III) a photopolymerization initiator. p</p>
申请公布号 EP0440444(A2) 申请公布日期 1991.08.07
申请号 EP19910300716 申请日期 1991.01.30
申请人 NIPPON PAINT CO., LTD. 发明人 MURAMOTO, HISAICHI;NINOMIYA, YUSUKE;ISHII, KEIZOU;ISHIKURA, SHINICHI
分类号 G03F7/033;G03F7/027;H05K3/00 主分类号 G03F7/033
代理机构 代理人
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