LOWER LAYER MATERIAL FOR ELECTRON BEAM LITHOGRAPHY AND PATTERN FORMATION USING THE SAME,申请号JP19890318667-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	LOWER LAYER MATERIAL FOR ELECTRON BEAM LITHOGRAPHY AND PATTERN FORMATION USING THE SAME
摘要
申请公布号	JPH03179724(A)	申请公布日期	1991.08.05
申请号	JP19890318667	申请日期	1989.12.07
申请人	OKI ELECTRIC IND CO LTD	发明人	ITO TOSHIO;SAKATA YOSHIKAZU
分类号	G03F7/11;H01L21/027	主分类号	G03F7/11
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Solar power generation apparatus capable of tracking sunlight

Erection system for solar panels

Oven appliance with dual opening and closing doors

Gas turbine combustor endcover with adjustable flow restrictor and related method

Lighting device

Natural gas adsorption devices

Temperature monitoring apparatus for a steam trap

Mounting device

Knit fabric and an article comprising same

Cable securing device

Layered seal for turbomachinery

Gear shift arrangement with parking block and method for its activation

Adaptive control of a flow control solenoid valve

Methodology for controlling a hydraulic control system of a continuously variable transmission

Differential apparatus

Optical scanning device and image forming apparatus

Single input and single-output hybrid system

Multi-speed transmission