| 摘要 |
A multi level wiring structure incorporated in a semiconductor device has a wiring layer sandwiched between insulating films and coupled to upper and lower conduction paths through contact windows formed in the insulating films, respectively, and the wiring layer is implemented by an aluminum-silicon alloy film sandwiched between upper and lower barrier films formed of a conductive substance selected from the group consisting of a refractory metal silicide, a refractory metal and a refractory metal alloy, and the barrier films are operative to prevent undesirable recrystallized silicon precipitates from direct contacting the upper and lower conduction paths, so that the wiring layer is kept well conductive with respect to the upper and lower conduction paths.
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