| 摘要 |
There is disclosed an atomized thin film forming apparatus for forming a thin film by spouting an atomized source solution toward a heated substrate. A pair of inner wall surfaces(3a, 3b) defined at the upper portion of a film forming nozzle(3) and disposed opposite with each other in the longitudinal direction of a film forming chamber(4) and restricted so as to be gradually narrowed in the interval therebetween toward a spouting opening(9) from an atomizer(1) with smooth curve. Hence, it is possible to prevent a mist of the source solution atomized by the atomier(1) from being locally stagnant in the film forming nozzle(3) and prevent a precipitation of the atomized source solution from growing. Consequently, the flow of the mist of the source solution is not prevented by the precipitation of the atomized source solution so that the thin film is formed over the surface of the substrate(6) with high uniformity for a long period of time. <IMAGE> |
