发明名称 RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD
摘要 PURPOSE:To improve resolution by using a resist compsn. obtd. by dissolving silicone resin contg. a specified structure in the molecule and a compd. having a triazine ring in an org. solvent. CONSTITUTION:A silicone compd. contg. a structure represented by formula I and a compd. having a triazine ring are dissolved in an org. solvent to obtain a resist compsn. In the formula I, each R1 is 2-4C alkenyl, R1's may be different from each other and each of l, m and n is a positive integer of 1-1,000. A nega tive type resist for the upper layer of a two-layered structure for ionized radia tion having superior sensitivity and resolution is obtd.
申请公布号 JPH03166546(A) 申请公布日期 1991.07.18
申请号 JP19890304673 申请日期 1989.11.27
申请人 FUJITSU LTD 发明人 SHIBA SHOJI
分类号 G03F7/038;C08G77/04;G03F7/075;H01L21/027 主分类号 G03F7/038
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