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发明名称
FINE PROCESSING OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH03156921(A)
申请公布日期
1991.07.04
申请号
JP19890296843
申请日期
1989.11.14
申请人
MITSUBISHI ELECTRIC CORP
发明人
SUZUKI SHOJI
分类号
H01L21/302;H01L21/3065;H01L21/368
主分类号
H01L21/302
代理机构
代理人
主权项
地址
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