发明名称 MANAGING METHOD FOR FILM THICKNESS OF MULTILAYER THIN FILM CIRCUIT BOARD
摘要 PURPOSE:To sufficiently manage the thickness of an insulating film by forming a film thickness checking hole simultaneously when viaholes for connecting between wiring films are formed at the film, and knowing the thickness of the film formed by measuring the depth. CONSTITUTION:Photosensitive organic insulating films 1b and a wiring film 1c are alternately laminated on a power source board 1a. When the films 1b and 1c are alternately laminated, viaholes 1bc for electrically connecting the film 1b to the film 1c are formed, and a film thickness checking hole 1d is simultaneously formed. The depth of the hole 1d, i.e., the thickness of the film 1b is measured in contact with the contact stylus, etc., of a film thickness measuring unit. If the thickness is improper, the improper film 1b is peeled at this time, and the film is reformed. Thus, the thickness of the film 1b can accurately by managed and formed.
申请公布号 JPH03150894(A) 申请公布日期 1991.06.27
申请号 JP19890290775 申请日期 1989.11.07
申请人 FUJITSU LTD 发明人 HOSOGAI MASAO;OTAGURO HIROYUKI
分类号 H05K3/46 主分类号 H05K3/46
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