| 摘要 |
PURPOSE:To obtain the positive type photoresist coating compd. which is im proved in sensitivity and resolution, is improved in heat resistance as well and is balanced in characteristics by incorporating a novolak resin having two specific repeating units as an alkali-soluble resin into this compsn. CONSTITUTION:This compsn. contains the novolak resin having the repeating unit expressed by formulas I and II as the alkali-soluble resin. In the formulas I, II, R denotes a hydrogen atom, alkyl group, allyl group, etc. and may be the same or different; R<1> denotes a hydrogen atom, alkyl group, etc. and may be the same or different; Ar denote a benzene ring, naphthalene ring, etc., and mazy be the same or different; m denotes 2 to 4; n denotes 1 to 2 integer and satisfies m+n=4; p and q are >=1 integer and satisfy SIGMAq/(SIGMAp+SIGMAq)<=0.2. The photoresist coating compsn. having the excellent sensitivity, resolution and heat resistance and the good balance is obtd. in this way. |
