发明名称 Method and apparatus for analyzing interference and apparatus for layout planning.
摘要 <p>A method and apparatus (160) is provided for analyzing interference caused between objects (220, 230, G1 - G3) when locating a plurality of objects (G1 - G3) in an n-dimensional space (210). The interference analyzing method takes the steps of dividing the n-dimensional space (210), approximating the object with a set of divided small areas, if the contour of the object is required to be approximated in more detail, dividing the small area into far smaller areas, approximating the object with a set of the far smaller areas, checking interference caused in the small area, if the interference is required to be checked more finely, iteratively doing the operation of dividing the small space into far smaller spaces and approximating the object with a set of the far smaller spaces, and if the interference is required to be roughly checked, organizing the far smaller spaces. Hence, the method and the apparatus (160) allows the rough interference analysis to be switched into the fine interference analysis or vice versa, thereby reducing the interference analysis data stored in memory. &lt;IMAGE&gt;</p>
申请公布号 EP0434051(A2) 申请公布日期 1991.06.26
申请号 EP19900124914 申请日期 1990.12.20
申请人 HITACHI, LTD. 发明人 TOKUMASU, SHINJI;KAWASHIMA, YASUMASA;NONAKA, SHIRO;NAKAJIMA, NORIHIRO;KUNITOMO, YOSHIO
分类号 G06F17/50 主分类号 G06F17/50
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