| 摘要 |
<p>PURPOSE:To simplify manufacturing process with improved reproductivity by manufacturing an electron emitting element by irradiating a high energy light to a metallic particle deposit on a substrate so as to form the deposit in the shape of projection or thin film structure. CONSTITUTION:Metallic particles are deposited on a substrate 1 from the direction normal to the substrate by the thickness of 0.1-1.0mum by a process such as in-gas evaporation, sputtering, etc. Here, the metallic particles are deposited as a deposit 5 not only on an Al layer 4 but also on the substrate 1. Finally the metallic particles 5 on the Al layer 4 and the Al layer 4 itself are removed so that metallic particle projections are not formed on an opening portion, followed by irradiation of a high energy light with which a high efficiency and a high output are expected such as eximer laser so that the deposit of the metallic particles on the substrate 1 form a projection 6 or a thin film structure 6'.</p> |
