Anti-contamination device for a vertical stand for gaseous phase deposition

摘要

The invention relates to an anti-contamination sleeve intended for vertical stands for gaseous phase deposition, of the type used for epitaxy of semiconductor materials. Such stands include a quartz tube (1) which rests on a base (10) having a restriction (13). According to the invention, the sleeve or counter tube is inserted into the tube (1) in the form of at least three quartz tiles (15, 16, 17) which reconstitute a cylinder. These tiles are held by a centring ring (25) which bears on a shoulder (24) of the base (10). Application to vertical epitaxy stands. <IMAGE>