发明名称 SHADOW MASK
摘要 <p>A cast ingot of an invar alloy is forged, hot-and cold-rolled, annealed and subjected to a controlled rolling to provide a shadow mask plate. An X-ray diffraction pattern is formed in an electron-beam hole-formation surface of the shadow mask plate, and a draft in a controlled rolling step is so controlled that the "g" value is 2 or more. The "g" value is given as g=(I1+I2)/I3 where I1=the X-ray diffraction integrated intensity at the {200} crystal faces; I2=the X-ray diffraction integrated intensity at the {111} crystal faces; and I3=the X-ray diffraction integrated intensity at the {220} crystal faces. The shadow mask plate is etched to provide shadow masks each having electron-beam holes formed therein, noting that one hole surface side which has greater {100} texture is used as a larger-diameter hole surface side.</p>
申请公布号 EP0222560(B1) 申请公布日期 1991.06.12
申请号 EP19860308478 申请日期 1986.10.30
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HIGASHINAKAGAWA, EMIKO PATENT DIVISION;OHTAKE, YASUHISA PATENT DIVISION;INABA, MICHIHIKO PATENT DIVISION;KANTO, MASAHARU PATENT DIVISION;SUGAI, SHINZO PATENT DIVISION
分类号 H01J9/14;H01J29/07 主分类号 H01J9/14
代理机构 代理人
主权项
地址