| 摘要 |
PURPOSE:To enable accurately polishing only a film on a projection without polishing a conductive film or the other film in a groove by performing polishing with a bubbleless polishing plate of the specified material together with an abrasive. CONSTITUTION:An Si substrate 11, the groove surface of which is coated by a conductive film or an insulating film, is polished with an abrasive 9 and a polishing plate 8 made of glass fibers, woven fluororesin or synthetic fibers, or bubbleless fluororesin and rotated by a rotation transmitter 6. Then only a film on the projection is accurately polished without polishing the conductive film or insulating film in the groove because the polishing plate is free from resiliency to be caused by bubbles. |
