发明名称 |
Method of producing an image reversal negative photoresist having a photo-labile blocked imide |
摘要 |
A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
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申请公布号 |
US5019488(A) |
申请公布日期 |
1991.05.28 |
申请号 |
US19900517530 |
申请日期 |
1990.04.24 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
MAMMATO, DONALD C.;JAIN, SANGYA;DURHAM, DANA;SPAK, MARK A.;USIFER, DOUGLAS A.;MCFARLAND, MICHAEL |
分类号 |
G03F7/039 |
主分类号 |
G03F7/039 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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