发明名称 Method of producing an image reversal negative photoresist having a photo-labile blocked imide
摘要 A method for producing a negative image by coating a substrate with a photosensitive layer containing a blocked hydrophobic polymer capable of deblocking in the presence of an acid, and an oxime sulfonate ester or o-quinone-4-sulfonyl-containing diazide, then imagewise exposing, treating with a gaseous base, removing excess base, overall flood exposing, baking and developing with an aqueous alkaline solution.
申请公布号 US5019488(A) 申请公布日期 1991.05.28
申请号 US19900517530 申请日期 1990.04.24
申请人 HOECHST CELANESE CORPORATION 发明人 MAMMATO, DONALD C.;JAIN, SANGYA;DURHAM, DANA;SPAK, MARK A.;USIFER, DOUGLAS A.;MCFARLAND, MICHAEL
分类号 G03F7/039 主分类号 G03F7/039
代理机构 代理人
主权项
地址