发明名称 METHOD AND APPARATUS FOR INSPECTING AND WRITING PATTERN
摘要 PURPOSE: To shorten the total scanning time for a wafer by providing each IC bar with more than one bar matching mark and writing a data at a position of an IC bar identified by optically scanning a scribe subpath using a laser beam thereby decreasing the number of scanning strips required for identifying and positioning the bar matching mark. CONSTITUTION: As a method for computerizing the matching of each bar 526 in an IC bar pattern inspecting and writing system 50, each IC bar 526 is provided, at a specified position, with at least two bar matching marks 527, 528 combined therewith at a stage for supplying a semiconductor water 525 having a plurality of IC bars 526 in the grid work of a scribe subpath 529. In order to identify the position of the bar matching marks 527, 528 for each IC bar 526, at least one scribe subpath 529 is scanned optically and the positron of each IC bar 526 is identified from the position of the bar matching marks 527, 528. A data is then written at the positron where the IC bar 526 is identified using a laser beam 104 to be modulated.
申请公布号 JPH03120815(A) 申请公布日期 1991.05.23
申请号 JP19890255103 申请日期 1989.09.29
申请人 TEXAS INSTR INC <TI> 发明人 BAANON AARU POORU;UIRIAMU JII MANZU;ANSONII BII UTSUDO;ESU CHIYAARUZU BAABAA;TOOMASU SHII PEN;JIERII DEII MERIMAN;DON JIEI UIIKUSU;CHII ENU SHIENGU;DEBITSUDO EI NOOUTSUDO;MAIKURU GOODON;RONARUDO ESU DORAFUZU;SEODOAA AARU BAMUBENETSUKU;GUREGORII JII SUKABOON;TOMU JII HADEIBAAKU;RORI EI KARUTSUSHI
分类号 G01N21/88;G01N21/956;G06T1/00;H01L21/027;H01L21/30;H01L21/66;H01L21/82;H01L27/118;H05K13/08 主分类号 G01N21/88
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