Process for the production of an inverted structure, active matrix display screen

摘要

Process for producing a wall for an active matrix display screen. By a first etching is formed stack rows of layers (L) with a metal at the bottom. The gaps between the rows are filled by a negative polyimide. On the surface are etched columns (C) and blocks (P). These elements serve as a mask for an etching leaving control transistors in a gate configuration below the same. Application to the production of liquid crystal display screens.