PROJECTION TYPE EXPOSURE DEVICE

摘要

PURPOSE:To facilitate easy maintenance and to improve reliability through enabling an on-line measurement, by measuring luminous distribution of injected light providing a photometer on a movable test piece stage in a reduced projection type device thereby judging brightness to obtain the optimum intensity. CONSTITUTION:An image on a reticle 3 is projected in reduced sized on a wafer 5 and exposed on a chip. The movement of test piece table 6 by the opening and closing of a shutter 2 and step-and-repeat is controlled by a computer 15 based on the conditions input to a control console 18. The luminous intensity distribution of injected light 7 is measured by a step-and-repeat dividing an exposed area 21 into small measuring points 22 around the light axis 23 using a photometer provided on the table 6. Measured value of each point is inputted to the computer 15 via an AD converter 17 to be judged whether or not it is within the allowance of luminous dispersion. When it is not under the optimum condition, the measurement is repeated until the optimum condition is obtained by adjusting the current of a light source or the shutter speed. This makes possible the exposure in the optimum condition without deteriorating a through-put.