<p>A total reflection X-ray fluorescence apparatus comprises a base material (6) having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector (13) such as an SSD for detecting fluorescent X-rays emerging from a specimen (7) located near the optically flat surface of the base material (6) and a second detector (11) such as a scintillation counter for detecting an intensity of an X-rays coming from the base material (6).</p>
申请公布号
EP0423803(A2)
申请公布日期
1991.04.24
申请号
EP19900120053
申请日期
1990.10.19
申请人
SUMITOMO ELECTRIC INDUSTRIES, LTD.;TECHNOS CO., LTD.,
发明人
OHSUGI, TETSUYA, C/O YOKOHAMA WORKS OF;KYOTO, MICHIHISA, C/O YOKOHAMA WORKS OF;NISHIHAGI, KAZUO