| 摘要 |
PURPOSE:To simplify the processing by a method wherein a conductor and an insulator are formed adjacent each other, an amorphous semiconductor layer and a rear electrode are laminated on the conductor and the insulator and these are cut in a simultaneous manner using an energy beam shaped asymmetrically with respect to the border line between the conductor and the insulator. CONSTITUTION:A transparent electrode 2 is laminatedly formed on the whole surface of a light-transmitting insulating substrate 1 and thereafter, with the electrode 2 cut and separated into two by laser scribing, a conductor 3 and an insulator 4 are formed in parallel with each other on the separated transparent electrodes 2 and 2 in a state that they are in contact with each other. Then, a lens 7 is arranged in the optical path of a laser beam LB and the laser beam LB is projected in a pulse status with width to cover both of the conductor 3 and the insulator 4. An open pattern of an iris 8, that is, a laser beam projection pattern 9 is an asymmetric pattern with respect to the border line between the conductor 3 and the insulator 4, for example. An amorphous semiconductor layer 5 and a rear electrode 6, which are located on the insulator 4, are both made to transpire and divided and the at the same time, the edge part of the electrode 6 is made to solidify at the trace of the transpired layer 5 in a state that is contacts with the surface of the insulator 4. |
