| 摘要 |
PURPOSE:To obtain a high resolving power and high reproduction accuracy of pattern shapes by incorporating a specific photosensitive material and alkaline soluble resin into the above compsn. CONSTITUTION:The photosensitive material expressed by formula I and the alkaline soluble resin are incorporated into the compsn. In the formula I, D1, D2 respectively denote 1,2-naphthoquinonediazide-5-sulfonyl group or 1,2- naphthoquinonediazide-4-sulfonyl group; R1, R2 respectively denote a hydrogen atom, -OH group, etc.; or -SO3R3; R3 denotes a substd. or unsubstd. aliphat. group or arom. hydrocarbon group; a, c, e are respectively 0 to 5 integer; b, d, f are respectively 0 to 4 integer. In addition, the relations 2<=(a+b+c+d+e+ f)<=9 and 2<=(a+b) are satisfied. The high resolving power is obtd. in this way and the mask sizes are exactly reproduced over the wide range of the mask line width. |
