| 摘要 |
PURPOSE:To easily change a wafer and a mask by detecting an absolute position at the time of starting and resetting a measurement of a wafer stage position executed by a laser interferometer. CONSTITUTION:The aligner is provided with a light source whose mutual position relation is fluctuated in accordance with a movement of a wafer stage 3 and a photodetecting means for detecting an optical axis position of a light beam emitted from this light source, and a means for detecting a position of the stage 3 by this light source and the photodetecting means at the time of starting a measurement and resetting the measurement. Also, this device is provided with the stage 3 for holding a wafer 2, a stage position measuring means for executing a position measurement of the stage 3 by using a laser interferometer 4, a stage driving control means for driving the stage 3 based on an output of this measuring means, and an alignment measuring means for detecting optically a misalignment between a mask 1 and the wafer 2, and based on the output of this measuring means, the wafer 2 is aligned against the mask 1 by the stage position measuring means and the stage driving control means, and thereafter, a pattern of the mask 1 is exposured and transferred to the wafer 2. |
