发明名称 NONVOLATILE SEMICONDUCTOR MEMORY AND METHOD OF PRODUCING THE SAME.
摘要 <p>A nonvolatile semiconductor memory having nonvolatile memory cells that electrically erase and write data. Each memory cell has a floating gate and a control gate formed on the channel region on the surface of a semiconductor substrate. The floating gate covers only part of the channel region. In the memory cell, therefore, a floating gate transistor and an enhancement transistor are connected in parallel. The floating gate transistor is deviated toward one side in the direction of width of the channel region or covers only the central portion of the channel region in the direction of width. Further, a plurality of memory cells are connected in series to constitute a basic block. The neighboring basic blocks are separated by the enhancement MOS transistor. In this memory, the memory cell (floating gate) and the enhancement MOS transistor (gate) are formed using the same mask in a self-aligned manner. In this memory, furthermore, the control gate and the floating gate are formed using the same mask in the self-aligned manner.</p>
申请公布号 EP0419663(A1) 申请公布日期 1991.04.03
申请号 EP19890910179 申请日期 1989.09.14
申请人 KABUSHIKI KAISHA TOSHIBA;TOSHIBA MICRO-ELECTRONICS CORPORATION 发明人 ASANO, MASAMICHI;IWAHASHI, HIROSHI 63-10, SHIKIMIDAI;KIRISAWA, RYOHEI ISOGO-DAI-6-RYO;NAKAYAMA, RYOZO ISOGO-MARUYAMADAI-HEIGHTS 4-404;INOUE, SATOSHI SANO-SO 2F;SHIROTA, RIICHIRO TOSHIBA-FURUKAWA APARTMENT 242;ENDO, TETSURO 6-13-31-106, KIKUNA;MASUOKA, FUJIO 1-14-6, TAKEYAMA
分类号 G11C16/04;H01L21/8247;H01L27/115;H01L29/788 主分类号 G11C16/04
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