| 摘要 |
PURPOSE:To accurately decide the development completion time of a resist coated on a multilayer film by a method wherein the periodic fluctuations in the measured reflected ray intensities are estimated to decide the real development end point. CONSTITUTION:A resist surface is irradiated with beams while the detected intensity fluctuations in reflected ray are monitored to decide the development end point. At this time, after deciding a temporary development end point, TEP, the periodic fluctuations between respective maximum and minimum points of the reflected ray intensities measured from the starting point of the measurement to the terminal TEP are calculated and the periodic fluctuations in the measured reflected ray intensities from the final minimum or maximum point to the real development end point are estimated to decide the real development end point. Furthermore, the periodic fluctuations in the measured reflected ray intensities between respective minimum and maximum points are approximately by linear-cubic polynominals so as to estimate the periodic fluctuations from the final minimum or maximum points to the real development end point by this approximation formula. |
