发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 <p>PURPOSE:To obtain the subject composition for fine processing, containing an alkali-soluble phenolic resin, quinone diazide compound and a specific compound, useful for producing semiconductor elements, magnetic bubble memory elements, integrated circuits, etc. CONSTITUTION:The objective composition containing (A) an alkali-soluble phenolic resin (e.g. an addition-condensation reaction product of phenols with aldehydes), (B) a quinone diazide compound (e.g. 1,2-benzoquinone diazide-4- sulfonic acid ester) and (C) a compound expressed by the formula (R1 to R4 are alkyl, aryl, aralkyl, alkoxy, nitro, halogen or alkenyl) [e.g. 2-(2'- hydroxyphenyl)-benzotriazole].</p>
申请公布号 JPH0352972(A) 申请公布日期 1991.03.07
申请号 JP19890187244 申请日期 1989.07.21
申请人 NIPPON ZEON CO LTD 发明人 OIE MASAYUKI;KAWADA MASAJI;YAMADA TAKAMASA
分类号 C09D11/00;C09D11/02;C09D11/03;C09D11/10;C09D11/103;C09D11/106 主分类号 C09D11/00
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