发明名称 Light sensitive compsn. contg. -imino-diazo-quinone n-sulphonyl cpd. - and alkali-soluble polymer of positive type useful as resist
摘要 Positive-type light sensitive compsn. contains an alkali-soluble polymer (I) and p-imidazoquinoneN-sulphonyl cpd(s) (II). Pref. (II) is added in an amt. of 0.1-0.7(wt) pts./pt. (I) (II) pref. is of formula (I) where R1-4 = H, halogen, CN a heterocyclic gp. -NR5R6, -SO2NR7R8 or a (substd) alkyl, alkoxy, aralkyl, alkaryl or alkenyl gp. R5-6 = H or a (substd) alkyl, aralkyl, alkaryl, alkenyl, or aryl gp. or NR5N6 = a heterocycle, R7 = 0 or opt. substd. alkyl, R8 = a (substd) alkyl, aryl, aralkyl, alkaryl, or alkenyl gp. R1 + R2 and/or RR3 + R4 may = one or two condensed carboxylic or heterocyclic rings, R = a (substd) aryl, aralkyl, alkaryl, or alkenyl, gp. n = 1, 2 or more. The compsn. may also contain a dyestuff borate complex (III) of the formula, D+ = cationic dyestuff, R9-12 a (substd) alkyl, aryl, aralkyl, alkaryl, alkenyl, or alicyclic gp. or a heterocyclic gp. USE/ADVANTAGE - The compsn. is useful for producing resists with a micro-pattern for ICs printing plates of non-Ag imaging materials. It has higher sensitivity than usual and gives higher contrast, making it suitable for replacing the conventional diazonaphthoquinone/novolak resin system.
申请公布号 DE4026544(A1) 申请公布日期 1991.02.28
申请号 DE19904026544 申请日期 1990.08.22
申请人 FUJI PHOTO FILM CO., LTD., MINAMI-ASHIGARA, KANAGAWA, JP 发明人 SHINOZAKI, FUMIAKI;ISHIGE, SADAO, FUJINOMIYA, SHIZUOKA, JP;UMEHARA, AKIRA, SHIZUOKA, JP
分类号 G03F7/039;C07C323/20;C07C381/10;C07D295/185;G03F7/004;G03F7/022;H01L21/027;H01L21/30 主分类号 G03F7/039
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