| 摘要 |
PURPOSE:To stably form patterns of a high resolution which are free from halation and notching even when the compsn. is used for a high-reflectivity substrate by adding a specific compd. to the compsn. CONSTITUTION:The compd. expressed by formula I is incorporated into the compsn. contg. a novolak resin and a quinone diazide photosensitive agent. In the formula, R1 to R5, R'5 denote H, 1 to 5C alkoxy, etc., or hydroxy. The compd. which exhibits the absorption max. for the light of a desired region among the above-mentioned compds. is usable and the more specific example thereof includes the compd. expressed by formula II, etc. |
