| 摘要 |
The invention relates to a rod-shaped magnetron sputtering cathode arrangement having an internal cooled permanent magnet system and a support tube for the target. The invention provides for at least one heat contact layer 38 to be located between the support tube 36 and the target comprising one or more ring(s) 37, 37', 37" pushed onto, particularly in a replaceable fashion, the support tube 36. During sputtering, the cathode 6 and the surface onto which sputtering is to take place can be subjected to relative motion in the longitudinal direction of the cathode 6, for which purpose an adjusting device is provided. The magnets 31 are arranged within the support tube 36 with their magnetic fields alternately in opposite directions along the longitudinal direction of the support tube 36. They have cylindrical or polygonal outer surfaces and end faces 44 which are parallel or inclined at an angle alpha to the longitudinal direction of the electrode 6 or the shaft 30. |
