| 摘要 |
<p>PURPOSE:To allow the peeling of color filters without adversely affecting a substrate and the accessories thereof by subjecting the color filters on a solid- state image pickup element to ashing in which oxygen plasma, etc., are utilized, then to ultrasonic cleaning in pure water. CONSTITUTION:The solid-state image pickup element 4 with the color filters 7 is set in a parallel flat plate type plasma ashing device and the color filters 7 are ashed by the oxygen plasma. The element is thereafter immersed in the pure water and is ultrasonically cleaned for 10 minutes. Namely, the color filters are ashed by using the oxygen plasma and the residues generated by the ashing treatment are easily removed by executing the ultrasonic cleaning in the pure water. The color filters are rapidly peeled in this way without damaging the solid-state image pickup element on the silicon substrate.</p> |
