Electron gun arrangement for use in the electron beam evaporation process.

摘要

An electron gun arragement for use in an electron beam evaporation process includes a permanent circuit (21-24) for deflecting the electron beam from its supply source toward its crucible (41-44) and an electromagnetic coil winding means (161-164; 181-184) for sweeping the electron beam from one point to another particular point on the substance to be evaporated. The electromagnetic coil winding means is disposed to surround the permanent magnet circuit.