| 摘要 |
PURPOSE:To restrain photomasks of use from increasing in number, to attain cost reduction, and to securely form an opening by a method wherein laminated insulating layers are successively subjected to a proximity exposure process in which a print gap for each insulating layer is so set as to be gradually smaller as the insulating layers are located closer to the top. CONSTITUTION:First of all, a first insulating layer 3 is applied by the use of a spinner onto a wiring board on which a first metal wiring 2 has been formed. Then, a positive type photosensitive first photoresist 5 is applied through a spinner. Ultraviolet rays hnu for instance, are made to irradiate the first photoresist 5 through the intermediary of a photomask at a print gap of Y1. A part of the first photoresist 5 exposed to ultraviolet rays and the first insulating layer 3 are removed, and then a positive type photosensitive second photoresist 6 is applied by the use of a spinner. Using the photomask 7 which has been used in a first proximity exposure process, ultraviolet rays hnu made to irradiate the second photoresist 6 at a prescribed print gap of Y2. At this point, the print gap Y2 is set smaller than the print gap Y1. |
