发明名称 PHOTOMASK AND PROJECTING EXPOSURE DEVICE
摘要 PURPOSE:To appropriately carry out compensation of necessary exposing time for pellicle which is pasted together to a photomask by pasting a bar code onto the pellicle frame which shows the class of pellicle. CONSTITUTION:The bar code 1 is pasted onto the pellicle frame 10 of the photo mask 11. Then the mask 11 is loaded on the prescribed position of the projecting exposure device, the bar code 1 is read by activating a bar code reading sensor part 2 of the device, and correct exposure is carried out utilizing exposure timing data compensated by an exposing timing compensating value which is stored within an exposing timing controlling device 5 based on the read out class code of pellicle. In this way, the exposing timing of the mask, which is various types of pellicle pasted together, can be automatically compensated.
申请公布号 JPH0320739(A) 申请公布日期 1991.01.29
申请号 JP19890155421 申请日期 1989.06.16
申请人 MATSUSHITA ELECTRON CORP 发明人 ARIYOSHI HIROSHI
分类号 G03F1/64;G03F7/20;H01L21/027;H01L21/30 主分类号 G03F1/64
代理机构 代理人
主权项
地址