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发明名称
HEAT TREATMENT DEVICE OF SEMICONDUCTOR WAFER AND MANUFACTURE OF SEMICONDUCTOR
摘要
申请公布号
JPH0320020(A)
申请公布日期
1991.01.29
申请号
JP19890155414
申请日期
1989.06.16
申请人
MATSUSHITA ELECTRON CORP
发明人
TAKAYAMA YUICHIRO
分类号
H01L21/22
主分类号
H01L21/22
代理机构
代理人
主权项
地址
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