| 摘要 |
PURPOSE:To prevent the deposition of foreign matter in the space enclosed by a mask, pellicle film and frame by sticking the pellicle to the mask in a chamber, the air in which is substd. with an inert gas. CONSTITUTION:Gas introducing ports 6a, 8a and gas discharge ports 6b, 8b are respectively provided in the main chamber 6 and preliminary chambers 8, 18, 28, 38. The mask 2 and the pellicle 1 are mounted to a pellicle sticking device of the one preliminary chamber 8 and a door 8c is closed. After the inside of the chamber is substd. with the inert gas, a gate valve 7 is opened and the pellicle sticking jig is put into the main chamber 6. The pellicle is then stuck to the mask 2. The mask 2 and the pellicle 1 are mounted to the pellicle sticking device successively in the preliminary chambers 18, 28, 38 and the air is substd. with the inert gas. The sticking device is then put in the main chamber 6 and the pellicle 1 is stuck to the mask 2. The deposition of the foreign matter in the space enclosed by the mask 2, the pellicle 1a and the frame 1b is prevented after the pellicle 1 is stuck to the mask 2. |
