| 摘要 |
PURPOSE:To prevent a transparent electrode pattern on a color filter from being disconnected by carrying out exposure in a light shielding film forming process while moving a photomask or substrate. CONSTITUTION:A light shielding film 9 is formed by applying negative resist where photosensitive light shielding resin, e.g. carbon black is dispersed over a transparent substrate 2 which has a transparent electrode coated with metal and exposing the transparent substrate 2 from behind. Then the photomask 11 for removing the light shielding film 9 outside a display area or the substrate 2 is moved slightly during the back exposure in the forming process of the light shielding film 9 to vary the exposure time of a position corresponding to the step part of the light shielding film 9 continuously or stepwise, so the step of the light shielding film 9 can be formed while varied continuously or in steps. Consequently, the disconnection of the transparent electrode due to the step coverage of the light shielding film 9 can be precluded. |
