发明名称 |
PROCESSO E DISPOSITIVO PARA O APLAINAMENTO DE SUPERFICIES ASPERAS,ESTRUTURADAS OU HETEROGENEAS |
摘要 |
In the method and the planing device (1) for evening rough, structured or heterogeneous surfaces with a compensation layer (6), an energy radiation-permeable covering film (17) is laminated onto a substrate carrier (11) bearing the surface (4) to be evened by means of a film pressing device (2) which consists of a sliding shoe and an advancing device (3). The contact zone between the film pressing device (2) and the substrate carrier (11) forms, during the lamination, a tapering lamination gap (5) which is constantly supplied with the film-forming or layer-forming organic coating material (9). <IMAGE> |
申请公布号 |
BR9000720(A) |
申请公布日期 |
1991.01.22 |
申请号 |
BR19909000720 |
申请日期 |
1990.02.16 |
申请人 |
HOECHST AG. |
发明人 |
BERNHARD HIERHOLZER;RAIMUND HAAS;WOLFGANG SPIESS |
分类号 |
B05C11/02;B05D1/42;B05D3/00;B05D3/06;B29C65/52;B29L9/00;B32B43/00;H01L21/48;H05K3/06 |
主分类号 |
B05C11/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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