发明名称 POLISHING METHOD FOR SEMICONDUCTOR DEVICE
摘要 PURPOSE:To sharply reduce a man-hour and a time required for production of a sample by a method wherein after the one surface of a semiconductor device is secured on the flat surface of a rotary type sample holder, the other surface is brought into contact with the polishing surface of a rotary table. CONSTITUTION:The one surface of a semiconductor device 1 is secured on the flat surface of a rotary type sample holder 3 by using a double-coated tape. The other surface of the semiconductor device 1 secured to the holder 3 is brought into contact with a rotary type polishing table 4, and with this state, the two members are rotated in the directions of arrow marks reverse to each other to apply a polishing work on the other surface of the semiconductor device 1.
申请公布号 JPH0310750(A) 申请公布日期 1991.01.18
申请号 JP19890146407 申请日期 1989.06.07
申请人 NEC YAMAGATA LTD 发明人 SATO MITSUO
分类号 B24B7/04;B24B37/27;B24B37/28;H01L21/304 主分类号 B24B7/04
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