发明名称 |
METHOD AND APPARATUS FOR RECOVERING AND REUSING RESIST COMPOSITION |
摘要 |
<p>A resist composition scattered from a spinner during the application into a silicon wafer in a coating chamber (1) is collected into one of preparatory recovery tanks (2,2') and then sent to a recovery tank (3) having a temperature sensor (8), a level sensor (9) and a viscosity sensor (4). The recovery tank (3) is kept (6) at a constant temperature, whereas the viscosity of the resist composition is adjusted to a predetermined value by automatically supplying a necessary amount of solvent (5) via an electro-magnetic valve (5'). The resist composition is then stored in storage tanks (7) kept at a constant temperature and reused in the coatings chamber whenever necessary, after filtering (11) undesirable substances.</p> |
申请公布号 |
EP0296249(A4) |
申请公布日期 |
1991.01.16 |
申请号 |
EP19880900587 |
申请日期 |
1987.12.25 |
申请人 |
KANTO KAGAKU KABUSHIKI KAISHA |
发明人 |
YAMASHITA, ASAAKI;MORI, KIYOTO;SAITO, TSUGIO;SHIMAUCHI, SHIRO |
分类号 |
G03C1/74;G03F7/00;G03F7/16;H01L21/027;H01L21/30;(IPC1-7):G03F7/00 |
主分类号 |
G03C1/74 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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