发明名称 Apparatus for forming thin film
摘要 An apparatus for forming thin film includes a vacuum container to which an active gas, an inert gas, or a mixture thereof is introduced, a source of evaporation for evaporating a substance being evaporated in the vacuum container, a counter electrode disposed in the vacuum container and holding a substrate for forming a thin film thereon in such a manner as to be opposed to the source of evaporation, a grid disposed between the source of evaporation and the counter electrode and having openings which allow the substance being evaporated to pass therethrough, a filament for thermionic emission disposed between the grid and the source of evaporation and a power source device for establishing a predetermined electric potential relationship between the grid, the counter electrode, and the filament.
申请公布号 US4982696(A) 申请公布日期 1991.01.08
申请号 US19890294377 申请日期 1989.01.06
申请人 RICOH COMPANY, LTD. 发明人 KINOSHITA, MIKIO;OHTA, WASABURO;NAKAZAWA, MASASHI
分类号 C23C14/32 主分类号 C23C14/32
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