| 摘要 |
PURPOSE:To improve the solubility of a polymer itself, to obtain high photosensitivity in forming a fine pattern and to improve dimensional accuracy by introducing a specified functional group into a molecular skeleton of an imide polymer. CONSTITUTION:A positive type photosensitive polyimide compsn. contg. a polyimide having repeating units of the formula and the content of the unit (m) of 20wt.% of the whole. In the formula, Ar1 is a tetravalent arom. hydrocarbon residue; Ar2 is a divalent arom. hydrocarbon residue with an acyloxy group on at least one position of ortho or meta of an arom. ring; Ar3 is a divalent arom. hydrocarbon residue. As said polyimide compsn. contains a polyimide wherein an acyloxy group is introduced into the main chain to improve the solubility in an org. solvent, the acyloxy group is hydrolyzed upon irradiation with light to provide a change in alkali solubility. As the result, the formation of a fine pattern which cannot be achieved by using the conventional positive type photosensitive polyimide becomes possible. |
