| 摘要 |
An exposure device includes a light source, means for transmitting radiation from the light source to the surface of a photosensitive film, and photosensitive information outputting means for measuring and outputting information which represents the state of exposure of the surface of the photosensitive film. A suitable exposure can be determined by detecting changes in the properties of the resist. In consequence, exposure can be adjusted to fit the exposed state of the photosensitive film which would be impossible in the prior art. Further, variations that occur in exposure can be decreased, and yield can be improved.
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