| 摘要 |
<p>An improved stereolithographic apparatus and method is described. In one embodiment, the improvement comprises immersing at least a portion of a part (109) in a volume of a liquid solvent in a vapor degreaser while subjecting the portion to ultrasonic agitation to substantially remove excess resin (111). Several examples of solvents are provided, including ethanol, and Freon TMS. In a second embodiment, the improvement comprises building the part (109) on a layer of liquid resin (103) supported by a volume of a dense, immiscible, and UV transparent intermediate liquid, and integratably immersing at least a portion of the built part (109) in the intermediate liquid, and then either subjecting the immersed portion to ultrasonic agitation to substantially remove excess resin (111), or subjecting the immersed portion to UV light. Several examples of intermediate liquids are provided, including perfluorinated fluids, such as Fluorinert FC-40, and water-based salt solutions, such as solutions of magnesium sulfate or sodium chloride in water.</p> |
