| 摘要 |
A method for measuring the width and profile of structures in a semiconductor wafer comprises the step of constructing test structures on the wafer shaped to function as moats for confining electrically conductive liquid. The moats have an elongated shape. By measuring the electrical resistance exhibited by the liquid within the moat, the dimensions of the moat and, thus, the other structures on the wafer can be measured. In an alternative embodiment, the conductive liquid is used to facilitate electrical contact to the various structures formed in the wafer.
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