| 摘要 |
PURPOSE:To develop a 2-cyclohexylcyanoacrylate polymer with a high sensitivity and high resolution by using a developing soln. contg. 2-methoxy ethanol. CONSTITUTION:The solvent mixture composed of the 2-methoxy ethanol system is used as the developing soln. for a positive type electron beam resist essentially consisting of the 2-cyclohexylcyanoacrylate polymer expressed by formula I at the time of develop8ing the above-mentioned resist. Namely, the developing soln. contg. the 2-methoxy ethanol in, for example, a soluble solvent and 2- ethoxy ethanol, 2-protoxy ethanol or 2-butoxy ethanol in an insoluble solvent is used. The high sensitivity and the high resolution are simultaneously satisfied by using the developing soln. contg. the 2-methoxy ethanol as the soluble solvent in such a manner. |
