| 摘要 |
<p>A reaction chamber (12) for a controlled reaction on a reaction surface on a sample (17) provides for controlled distribution of radiant energy over the reaction surface to offset radiant heat loss of the sample, and establishes uniform distribution of reactant flow on the sample. A lamp housing (11) supplies radiant energy through a window (44) and over the sample (17), which absorbs at least a component of the radiant energy. The sample support member (15) which supports the sample within the reaction chamber is formed of a material which is essentially transparent to the radiant energy so that it does not behave as a susceptor. Direct radiant energy from the lamps (L) and radiant energy reflected from a reflecting surface (101-107) combines to form a controlled distribution of radiant energy at the reaction surface which offsets the distribution of heat loss on the sample and minimizes temperature gradients on the reaction surface. A source of reactant gas is coupled through a gas port (45) and a perforated distribution plate (49) to the reaction chamber between the window and the reaction surface. An exhaust port (55) is supplied in the reaction chamber for pumping gas out of the reaction chamber to maintain the distributed flow of reactant.</p> |
