| 摘要 |
<p>A magentron sputtering apparatus includes a rotatable magnet. At least a portion of the centerline of the magnet lies on a curve defined by <MATH> where xi (u) is a preselected erosion profile. When stationary, the magnet generates a localized magnetic field of approximately constant width. In operation, when the magnet is rotated, it generates the preselected erosion profile in the target. The preselected erosion profile may be constant.</p> |
