| 发明名称 |
SEMICONDUCTOR DIFFUSION FURNACE INNER TUBE |
| 摘要 |
<p>An inner tube (1) for use in a semiconductor diffusion furnace is provided comprising a liner or diffusion tube and an insulating layer (2) formed on the entire outer surface of the tube by spraying, typically plasma spraying. The sprayed insulating layer is resistant to deterioration and peeling, ensuring an extended period of service for the tube.</p> |
| 申请公布号 |
EP0355658(A3) |
申请公布日期 |
1990.11.22 |
| 申请号 |
EP19890115018 |
申请日期 |
1989.08.14 |
| 申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
MATSUMOTO, FUKUJI;TAWARA, YOSHIO;HAYASHI, MICHIO;YAMADA, OSAMU |
| 分类号 |
H01L21/31;C23C4/10;C30B31/10;H01L21/22;(IPC1-7):C30B31/10 |
主分类号 |
H01L21/31 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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