发明名称 Semiconductor integrated circuit device of multilayer interconnection structure
摘要 A semiconductor integrated circuit device of multilayer interconnection structure includes a pad (34) formed of a multilayer interconnection layer (52, 54). The power source pad (34) is connected to a power source interconnection layer (33) via a lead-out interconnection layer (35) which is formed of the same multilayer interconnection layer (52, 54) as that used to form the power source pad (34).
申请公布号 US4970572(A) 申请公布日期 1990.11.13
申请号 US19890318791 申请日期 1989.03.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 KATO, TOSHIYA;ENKAKU, MOTOHIRO
分类号 H01L23/52;H01L21/3205;H01L23/522;H01L23/528 主分类号 H01L23/52
代理机构 代理人
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