发明名称 SUBSTRATE INDEX FORMING METHOD
摘要 PURPOSE:To easily and efficiently form the index of a specific tile on the substrate without producing any shavings by exposing photoresist through a display part and then etching and peeling the photoresist, and thus forming the index. CONSTITUTION:A metallic film 2 is formed on the surface of the substrate (a) and coated with the photoresist 3, on which a transmission type liquid crystal display panel 4 is arranged. Then the title of an index to be provided on the surface is displayed on the display part 8 of a liquid crystal display panel 4, and the display part 8 is irradiated with light 9 for exposure from the opposite side of the photoresist, which is exposed through the display part 8. After this exposure, the photoresist is developed and the metallic film is etched to form the index of the title on the substrate. Consequently, no cutting shavings are produced and the display on the display part is only changed by controlling the liquid crystal display panel to easily and efficiently provide the index of the desired title on the substrate.
申请公布号 JPH02273719(A) 申请公布日期 1990.11.08
申请号 JP19890095291 申请日期 1989.04.17
申请人 CASIO COMPUT CO LTD 发明人 KAMATA HIDEKI
分类号 G02F1/13;H01L21/027;H01L21/30;H01L21/336 主分类号 G02F1/13
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