发明名称 Carbonylmethylene-heterocyclic compounds containing trihalogenomethyl groups, process for their preparation, and light-sensitive mixture containing the compounds
摘要 Disclosed is a compound of the general formula <IMAGE> wherein L=H or CO-(R1)n(CX3)m, M=alkylene, alkenylene, Q=S, Se, O, dialkylmethylene, alken-1,2-ylene, 1,2-phenylene or N-R, with M+Q together forming 3 or 4 ring members, R=alkyl, aralkyl or alkoxyalkyl, R1 is an aromatic group and X=Cl, Br or I, with n=O and m=1 or n=1 and m=1 or 2. The compounds, on exposure, eliminate HX and form free radicals and are therefore highly effective as acid donors and free radical initiators for photochemical processes.
申请公布号 US4966828(A) 申请公布日期 1990.10.30
申请号 US19840651116 申请日期 1984.09.13
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 DOENGES, REINHARD;RUCKERT, HANS;GEISSLER, ULRICH;STEPPAN, HARTMUT
分类号 C07D277/20;C07D209/12;C07D215/10;C07D215/12;C07D215/14;C07D277/12;C07D277/64;C07D277/84;C07D293/00;C07D293/12;C07D521/00;C08F2/00;C08F2/50;C08G85/00;G03C1/00;G03C1/675;G03F7/029 主分类号 C07D277/20
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